Abstract
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The monograph is devoted to the results of electron microscopic studies of films structure and the laws of its formation during discrete deposition of vapor-plasma streams formed by pulsed laser sputtering of metal and semiconductor targets on a substrate. The results of investigations of structural and phase transformations in films during annealing and natural aging are also presented.
The publication is intended for students, post-graduate students and lecturers of physical, technical and materials science specialties.
